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PGS5T


Course: Thin layers and surfaces

Department/Abbreviation: SLO/PGS5T

Year: 2020

Guarantee: 'prof. RNDr. Jan Peřina, Ph.D.'

Annotation: Students are assumed to master the topics described in the content of the subject.

Course review:
The aim of the subject is to acquaint students with the optical properties of thin films (TF) (isotropic, anisotropic, homogeneous, non-homogeneous) from dielectric and metallic materials and their applications based on a deeper understanding of physical principles. Attention is also paid to the properties of thick layers and their combinations with TF systems as well as layers in partially coherent light. The methods of TF preparation and control of their application are presented. The theoretical basis follows the solution of Maxwell equations for plane monochromatic wave, from which the transformation relations of the tangential components of the electric and magnetic field vectors are derived, allowing to define the amplitude and power macroscopic parameters: reflectivity and transmissivity. There are discussed theoretically interesting problems, such as the reversibility principle, the properties of symmetric TF systems, color effects on TF, the relation of TF to photonic crystals and waveguide structures, etc. Examples of practical designs of basic TV structures such as antireflective and highly reflective systems (and their combinations) are given, narrowband filters and polarizing filters. The principles of evaluation of ellipsometric measurements are mentioned. The student will also be informed about the principles of the basic deposition techniques of thin films and their optical and mechanical characterization. In terms of the subject the basic principles of thin films deposition using physical and chemical methods will be explained. Emphasis will be placed on the description of the physical vapor methods and their various modifications (e.g. e-beam, MBE) and on the description of low-temperature plasma sputtering methods. The course will also focus on the basic principles of deposition of thin films using chemical vapor deposition methods (CVD) with emphasis on plasma-assisted methods and other specialized CVD methods. The next aim of the subject is to acquaint students with the optical properties of thin films (TF) (isotropic, anisotropic, homogeneous, non-homogeneous) from dielectric and metallic materials and their applications based on a deeper understanding of physical principles. Attention is also paid to the properties of thick layers and their combinations with TF systems as well as layers in partially coherent light. The methods of TF preparation and control of their application are presented. The theoretical basis follows the solution of Maxwell equations for plane monochromatic wave, from which the transformation relations of the tangential components of the electric and magnetic field vectors are derived, allowing to define the amplitude and power macroscopic parameters: reflectivity and transmissivity. There are discussed theoretically interesting problems, such as the reversibility principle, the properties of symmetric TF systems, color effects on TF, the relation of TF to photonic crystals and waveguide structures, etc. Examples of practical designs of basic TV structures such as antireflective and highly reflective systems (and their combinations) are given, narrowband filters and polarizing filters. The principles of evaluation of ellipsometric measurements are mentioned. Furthermore, the methods of testing of mechanical and tribological properties of TF and coatings will be discussed. The theory of depth sensing indentation will be explained and basic contact scenarios for flat punch, spherical, conical and pyramidal indentor will be analyzed. Factors affecting the nanoindentation test will be discussed in details. The principles of the scratch test and the Pin-on-Disk test, as the fundamental tests for evaluation of adhesion-cohesion properties and wear, will be explained.